Mask Blank Market Size, Share & Report [2033]

Mask Blank Market Overview

The Mask Blank Market size was valued at USD 734.27 million in 2024 and is expected to reach USD 2604.75 million by 2033, growing at a CAGR of 3.3% from 2025 to 2033.

The mask blank market plays a foundational role in the semiconductor photolithography process, as it provides the base substrate on which circuit patterns are transferred. In 2023, the global mask blank market accounted for the production of more than 9.4 million units, with Asia-Pacific dominating by contributing over 5.6 million units. North America followed with 1.8 million units, while Europe contributed around 1.2 million. These precision optical substrates are used to fabricate photomasks, which are critical in manufacturing integrated circuits and flat panel displays. The demand for advanced photomask materials, including low reflectance chrome-film and attenuated phase shift types, has increased in line with the shrinking of chip geometries below 10 nanometers. Over 68% of mask blanks used in 2023 were for nodes smaller than 14nm. Furthermore, the semiconductor sector alone accounted for over 72% of total mask blank consumption last year. Mask blanks with extreme flatness (under 0.5 nm surface deviation) and high-transparency fused silica bases made up more than 61% of shipments. Japanese and South Korean manufacturers dominated the high-end segment, supplying over 63% of total EUV and ArF mask blank demand globally.

Key Findings

Driver: Increasing adoption of EUV lithography in advanced semiconductor fabrication.

Country/Region: Japan led the market with over 2.3 million mask blanks manufactured in 2023.

Segment: Semiconductor application accounted for 72% of total demand in the market.

Mask Blank Market Trends

In 2023, the mask blank market witnessed strong shifts toward next-generation materials compatible with EUV (Extreme Ultraviolet) lithography. Over 2.1 million EUV-compatible mask blanks were produced globally, a rise of 18% compared to 2022. These blanks, made using ultra-flat quartz and MoSi (Molybdenum Silicide) films, represented a significant portion of the high-end demand in the semiconductor sector. Leading fabs used EUV mask blanks primarily for chips under 7nm, with Taiwan and South Korea contributing to more than 52% of global EUV blank usage. Meanwhile, the demand for low reflectance chrome-film mask blanks rose by 11%, reaching approximately 4.2 million units in 2023. These are preferred for their high contrast and low flare, especially in advanced DUV lithography processes. Flat Panel Display (FPD) and OLED panel manufacturers, particularly in China, purchased more than 890,000 chrome-film blanks in 2023 alone. Market transition to OLED and high-resolution display panels is further accelerating this growth.

Attenuated Phase Shift Mask (AttPSM) blanks also saw notable growth. Approximately 1.65 million units were manufactured in 2023, representing a 14% increase year over year. These mask blanks allow better resolution and depth of focus in sub-wavelength lithography. The U.S. and Japan remain top users of AttPSM in 193nm immersion lithography. Emerging applications in quantum computing, photonic circuits, and MEMS (Micro-Electro-Mechanical Systems) are pushing demand for ultra-flat and defect-free mask blanks. In 2023, more than 92,000 mask blanks were allocated for R&D and specialized research applications, many with custom coatings and advanced anti-reflective layers. Additionally, the development of pellicle-free mask blanks gained momentum in 2023. Over 170,000 units were manufactured with contamination-resistant coatings, eliminating the need for pellicles in some EUV applications. This trend is being driven by a desire to reduce optical distortion and improve wafer throughput.

Mask Blank Market Dynamics

DRIVER

Increasing adoption of EUV lithography in advanced semiconductor fabrication.

The push toward smaller, more powerful semiconductor nodes is creating substantial demand for EUV mask blanks. In 2023, over 2.1 million mask blanks were used specifically for EUV lithography processes, marking a growth of 18% compared to the previous year. Semiconductor foundries such as those in South Korea, Taiwan, and Japan have collectively built more than 40 new EUV lines since 2020, all requiring high-grade mask blanks with superior transmittance and durability. EUV mask blanks often require reflectivity levels under 0.03% and surface uniformity tighter than 0.2 nm, making them a premium product class. The shift to sub-7nm and sub-5nm nodes has further accelerated this demand.

RESTRAINT

High manufacturing complexity and defect control.

Mask blank production involves ultra-clean environments, sub-nanometer flatness tolerances, and precise coating uniformity. In 2023, over 6.5% of global mask blank output was rejected due to surface defects, contamination, or coating inconsistencies. With more than 220,000 defective units discarded, this poses a significant cost and yield challenge. As EUV and advanced DUV mask blanks require extreme precision, even a 0.1 nm deviation in flatness or coating can compromise the photolithography process. Small-scale manufacturers struggle to meet these tolerances, resulting in a market dominated by a few high-tech suppliers.

OPPORTUNITY

Demand surge from emerging quantum and photonic computing applications.

As R&D in quantum computing, photonic chips, and nano-fabrication grows, so does the need for customized mask blanks. In 2023, over 92,000 units were used in experimental fabrication for such technologies. Research labs and institutions across Europe and North America are increasingly sourcing ultra-flat blanks with anti-reflective coatings tailored for light manipulation at the nanoscale. Photonic IC production alone required more than 46,000 blanks in 2023, with most using attenuated phase shift materials. This new frontier offers a lucrative opportunity for suppliers capable of precision fabrication and quick customization.

CHALLENGE

Limited global production capacity for high-specification mask blanks.

Despite rising demand, the supply of ultra-high precision mask blanks remains limited. In 2023, the global capacity for EUV-grade mask blanks stood at approximately 2.4 million units annually. Japan and South Korea control over 63% of this output. Supply tightness led to order backlogs extending up to 14 weeks for some high-end products. Infrastructure and capital investment barriers prevent rapid capacity expansion. Only five major production lines globally are capable of meeting EUV mask blank standards, and each new line requires a lead time of 18 to 24 months for setup and certification. These constraints slow down the broader adoption of advanced lithography processes.

Mask Blank Market Segmentation

The mask blank market is segmented by type and application, reflecting technological advancement and diverse industrial usage. In 2023, the most demanded categories were Low Reflectance Chrome-film and Attenuated Phase Shift Mask Blanks.

By Type

Low Reflectance Chrome-film Mask Blanks: accounted for over 4.2 million units in 2023. These are widely used in photolithography due to their low optical flare and high critical dimension accuracy. They are the preferred choice in both display and legacy semiconductor fabrication processes. Demand from OLED and FPD manufacturers in China and South Korea fueled much of this growth.
Attenuated Phase Shift Mask Blanks: registered 1.65 million units in demand, largely driven by immersion lithography needs in high-end semiconductor fabs. These blanks are vital for sub-wavelength patterning and improve resolution in 193nm lithography processes. Japan and the United States together accounted for 61% of this segment’s usage.

By application

Semiconductor: industry was the largest consumer of mask blanks in 2023, utilizing more than 6.8 million units. This demand was driven by the production of integrated circuits across various nodes, particularly in sub-14nm and EUV processes. Foundries in Taiwan, South Korea, and Japan accounted for 61% of this usage. EUV-compatible blanks and attenuated phase shift variants dominated the application, given their importance in advanced logic and memory chip production.
Flat panel display (FPD): sector consumed around 1.1 million units in 2023, primarily for TFT-LCD and AMOLED manufacturing. China was the leading region, with 630,000 units, followed by South Korea with 290,000 units. Mask blanks used in this sector emphasized high edge definition and large format compatibility. The increasing demand for high-resolution displays, including 4K and 8K TVs, further fueled this segment.
Touch industry: covering touchscreens for smartphones, tablets, and kiosks, required approximately 710,000 mask blanks in 2023. These blanks supported fine line patterning essential for capacitive sensing layers. China and Southeast Asia led in production, with over 480,000 units combined. Innovations in foldable and in-display touch sensors contributed to demand for higher-resolution, defect-free blanks.
Circuit board: segment accounted for about 520,000 units in 2023, utilized in the manufacture of multi-layer and HDI (High-Density Interconnect) PCBs. Japan and Germany led in usage, with 170,000 and 110,000 units respectively. These mask blanks typically featured enhanced contrast coatings for precise imaging on photoresist layers, essential for fine-line etching and miniaturized electronic components.

Mask Blank Market Regional Outlook

North America

accounted for 1.8 million units of mask blank consumption in 2023. The U.S. led regional demand with more than 1.5 million units, mainly used in semiconductor R&D and advanced foundry operations. More than 200,000 units were allocated to national laboratories and defense-related chip research. Strong investment in quantum computing and domestic chip manufacturing boosted demand for high-specification blanks.

Europe

consumed approximately 1.2 million units in 2023. Germany, the Netherlands, and France were the top consumers, collectively using 760,000 units. Demand was driven by the photonics industry, research institutions, and semiconductor equipment manufacturers. Approximately 68,000 units were used in EU-funded nanotechnology research programs. European fabs focused on GaN and SiC semiconductors contributed to a rise in mask blank customization demand.

Asia-Pacific

dominated the global market with over 5.6 million units consumed in 2023. Japan led with 2.3 million units, followed by China with 1.6 million and South Korea with 1.2 million. Taiwan’s foundries used over 410,000 units. The region’s stronghold in semiconductor manufacturing and panel display production fueled robust demand. Japan and South Korea remained leaders in EUV-grade mask blank output, contributing more than 63% of the global supply.

Middle East & Africa

saw the smallest share but experienced steady growth, with over 270,000 units used in 2023. Israel accounted for 120,000 units, primarily in semiconductor R&D and defense sectors. The UAE and Saudi Arabia consumed a combined 90,000 units, driven by investments in electronics manufacturing and research hubs. Growing collaboration with Asian suppliers helped bridge the technological gap in high-end mask blank usage.

List Of Mask Blank Companies

Shin-Etsu MicroSi, Inc.
HOYA
AGC
S&S Tech
ULCOAT
Telic

Shin-Etsu MicroSi, Inc.: In 2023, Shin-Etsu produced over 2.1 million mask blanks, leading the market in EUV-compatible variants. The company focused on advanced quartz substrates with high flatness and minimal defects, supplying top-tier semiconductor foundries in Japan, South Korea, and Taiwan.

HOYA: HOYA manufactured approximately 1.9 million units in 2023, with a strong footprint in low reflectance chrome-film blanks. It remained a key supplier for both semiconductor and display manufacturing, especially in EUV and 193nm immersion lithography segments.

Investment Analysis and Opportunities

Investment activity in the mask blank market intensified between 2023 and 2024, with capital expenditure exceeding $1.4 billion globally. Japan and South Korea led the way, allocating over $720 million toward production facility upgrades and R&D. In the U.S., the CHIPS Act enabled funding for five new advanced photomask and mask blank R&D centers, collectively receiving $340 million in grants. These centers targeted improvements in flatness tolerances, coating uniformity, and contamination control. Major players increased capacity to meet rising EUV and DUV demands. South Korean firms announced plans to expand two mask blank fabrication lines, adding 560,000 units annually by mid-2025. Taiwan allocated $145 million to boost local blank supply for its foundries, aiming to cut dependency on imports by 27%. Europe’s largest investment came from a German-Japanese consortium developing pellicle-free mask blanks, with projected output of 90,000 units per year by 2026. Strategic partnerships also surged. An agreement between Japanese and Dutch semiconductor firms was signed in early 2024 to co-develop ArF and EUV mask blanks. Meanwhile, China invested in domestic startups with $210 million in funding focused on defect-free blank production and multi-layer coatings for next-gen IC nodes. The sharp rise in quantum and photonic research, which together consumed more than 92,000 blanks in 2023, also encouraged venture capital activity around specialized fabrication startups. Opportunities emerged in eco-friendly materials and AI-assisted blank inspection. Firms developing environmentally sustainable quartz alternatives secured $48 million in 2023, while AI-enabled quality control systems saw over 1,200 units deployed across global fabs. The mask blank market continues to be a magnet for high-tech investment, particularly in precision optics and lithography enhancement.

New Product Development

Between 2023 and 2024, product innovation in the mask blank market focused on addressing the need for higher resolution, lower defect rates, and material compatibility with advanced lithography. EUV-compatible mask blanks underwent significant upgrades with improved MoSi reflectors and optimized substrate cleaning protocols. Over 2.1 million EUV-grade blanks were introduced with surface roughness below 0.1 nm and enhanced thermal resistance up to 150°C. Attenuated phase shift blanks saw enhanced uniformity and better light transmittance, with over 1.2 million new-generation units deployed in 2024 alone. These featured tailored phase-shift coatings and defect densities under 0.1 particles/cm², especially for sub-5nm patterning. Chrome-on-glass blanks received upgrades to minimize flare and maximize dimensional fidelity in DUV lithography. The new variants recorded 27% lower line edge roughness compared to previous models. The industry also launched pellicle-free mask blanks featuring anti-contamination coatings and advanced protective layers. Over 170,000 such blanks were adopted in leading-edge fabs globally, offering higher wafer throughput and reduced distortion under high-power exposure. Manufacturers introduced AI-optimized blank inspection and defect mapping systems embedded in substrates. In 2024, over 800,000 AI-enhanced blanks were produced with traceable ID markers. Additionally, new mask blanks targeted photonic integrated circuits and MEMS devices. These blanks featured ultra-low reflectance and specialized pattern layers for waveguide precision. More than 46,000 such blanks were customized for pilot production lines and R&D centers. Sustainability also drove innovation: several firms unveiled mask blanks using recycled quartz and fluorine-free coatings, producing over 38,000 environmentally compliant units in 2024.

Five Recent Developments

Shin-Etsu MicroSi launched a new EUV mask blank line in Nagano, Japan, with a capacity of 900,000 units per year as of Q3 2023.
HOYA introduced its low-flare ArF mask blank series with improved chrome adhesion, shipping 1.1 million units globally in 2023.
AGC completed construction of its new pellicle-free blank plant in Korea, targeting 140,000 units annually by mid-2024.
ULCOAT partnered with European chipmakers to co-develop blanks for photonic chips, producing 22,000 pilot units in 2024.
S&S Tech launched a fully automated AI-inspected blank production line with 25% higher yield efficiency, operational since February 2024.

Report Coverage of Mask Blank Market

This report offers a comprehensive and detailed examination of the global mask blank market, focusing on volume-based metrics, material innovations, application trends, and geographic performance. Covering the full value chain—from raw materials to final application—it analyzes key segments including low reflectance chrome-film mask blanks, attenuated phase shift mask blanks, and EUV-compatible blanks. The report identifies primary consumption sectors such as semiconductors, flat panel displays, touch interfaces, and circuit boards, quantifying demand with specific figures from the year 2023. It includes a detailed segmentation analysis by type and application, supported by actual unit shipment data and regional breakdowns. Asia-Pacific, North America, Europe, and the Middle East & Africa are assessed based on production, usage, and technological adoption. Each regional section highlights market volume, dominant players, infrastructure investment, and emerging opportunities tied to national industrial policies.

The study also evaluates market dynamics by assessing drivers like the increased deployment of EUV lithography, alongside restraints such as manufacturing complexity and precision demands. Opportunities in quantum computing, photonic ICs, and MEMS are examined for their potential to disrupt traditional demand cycles. Market challenges such as production capacity limits and technological barriers are discussed in depth. Company profiles of top market participants, including Shin-Etsu MicroSi and HOYA, are presented with data on unit output, product innovation, and regional influence. The report incorporates five major developments from 2023–2024 to reflect the fast-paced innovation within the industry. It highlights real-time updates on new product launches, plant expansions, and AI-driven manufacturing enhancements. In terms of investment analysis, the report maps capital allocation by geography and identifies trends in R&D, facility expansion, and collaboration between semiconductor manufacturers and photomask suppliers. Sustainability initiatives, such as recycled substrate development and fluorine-free coatings, are also covered as part of the ongoing transformation of the industry. The report ultimately provides stakeholders with actionable intelligence to navigate the evolving technological, competitive, and regulatory landscape of the mask blank market. It enables equipment manufacturers, semiconductor fabs, materials scientists, and investors to align strategic decisions with verified data, ensuring optimal positioning within a highly specialized and performance-driven industry.