Titanium Sputtering Target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the titanium, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips.
This report describes the development of the industry by upstream & downstream, industry overall and development, key companies, as well as type segment & market application and so on, and makes a scientific prediction for the development industry prospects on the basis of analysis, finally, analyzes opportunities for investment in the industry at the end of the report.
Development & Trend
Region (North America, Europe, Asia-Pacific, South America, Middle East, Africa):
Company (Tosoh, JX Nippon, Honeywell Electronic Materials, KFMI, Sumitomo Chemical Com-pang, Sumitomo Chemical Com-pang, Plansee, ULVAL, KJLC, China New Metal Materials, CXMET etc.):
Product & Service
Business Operation Data