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This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.
Market Analysis and Insights: Global Plasma Etch System Market
The global Plasma Etch System market was valued at US$ 6281.4 in 2020 and will reach US$ 12400 million by the end of 2027, growing at a CAGR of 12.0% during 2022-2027.
Global Plasma Etch System Scope and Market Size
The global Plasma Etch System market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Plasma Etch System market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region (country), by Type and by Application for the period 2016-2027.
Segment by Type
Inductively Coupled Plasma (ICP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Others
Segment by Application
Semiconductor Industry
Medical Industry
Electronics & Microelectronics
Others
The Plasma Etch System market is analysed and market size information is provided by regions (countries). Segment by Application, the Plasma Etch System market is segmented into North America, Europe, China, Japan, Southeast Asia, India and Other Regions.
By Company
Oxford Instruments
ULVAC
Lam Research
AMEC
PlasmaTherm
SAMCO Inc.
Applied Materials, Inc.
Sentech
SPTS Technologies (an Orbotech Company)
GigaLane
CORIAL
Trion Technology
NAURA
Plasma Etch, Inc.
Tokyo Electron Limited
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.
Market Analysis and Insights: Global Plasma Etch System Market
The global Plasma Etch System market was valued at US$ 6281.4 in 2020 and will reach US$ 12400 million by the end of 2027, growing at a CAGR of 12.0% during 2022-2027.
Global Plasma Etch System Scope and Market Size
The global Plasma Etch System market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Plasma Etch System market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region (country), by Type and by Application for the period 2016-2027.
Segment by Type
Inductively Coupled Plasma (ICP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Others
Segment by Application
Semiconductor Industry
Medical Industry
Electronics & Microelectronics
Others
The Plasma Etch System market is analysed and market size information is provided by regions (countries). Segment by Application, the Plasma Etch System market is segmented into North America, Europe, China, Japan, Southeast Asia, India and Other Regions.
By Company
Oxford Instruments
ULVAC
Lam Research
AMEC
PlasmaTherm
SAMCO Inc.
Applied Materials, Inc.
Sentech
SPTS Technologies (an Orbotech Company)
GigaLane
CORIAL
Trion Technology
NAURA
Plasma Etch, Inc.
Tokyo Electron Limited
Frequently Asked Questions
This market study covers the global and regional market with an in-depth analysis of the overall growth prospects in the market. Furthermore, it sheds light on the comprehensive competitive landscape of the global market. The report further offers a dashboard overview of leading companies encompassing their successful marketing strategies, market contribution, recent developments in both historic and present contexts.
- By product type
- By End User/Applications
- By Technology
- By Region
The report provides a detailed evaluation of the market by highlighting information on different aspects which include drivers, restraints, opportunities, and threats. This information can help stakeholders to make appropriate decisions before investing.
