Global Photoresist and Photoresist Ancillary Market Research Report 2021

Photoresists are light-sensitive materials that are primarily used in fabrication and packaging of semiconductors, integrated circuits, flat panel displays and printed circuit boards. Photoresists play an important role in photolithography and photo-patterning process. Photoresists consist of resin or polymer, solvent and photo-sensitizer. These are segmented into positive and negative photoresists based on developing option. Photoresists are applied on the surface of a wafer and further exposed to light of pre-determined wavelength. Photoresist ancillaries are supporting materials that are used to improve the efficiency and resolution of the photolithography process. These are used right from the start of the process such as adhesion promotion of photoresists to wafer substrate in order to develop photoresists to remove excessive photoresists after the developer treatment. 

Market Analysis and Insights: Global Photoresist and Photoresist Ancillary Market
The global Photoresist and Photoresist Ancillary market was valued at US$ XX million in 2019 and it is expected to reach US$ XX million by the end of 2026, growing at a CAGR of XX% during 2021-2026.

Global Photoresist and Photoresist Ancillary Market: Drivers and Restrains
The research report has incorporated the analysis of different factors that augment the market’s growth. It constitutes trends, restraints, and drivers that transform the market in either a positive or negative manner. This section also provides the scope of different segments and applications that can potentially influence the market in the future. The detailed information is based on current trends and historic milestones. This section also provides an analysis of the volume of production about the global market and about each type from 2016 to 2027. This section mentions the volume of production by region from 2016 to 2027. Pricing analysis is included in the report according to each type from the year 2016 to 2027, manufacturer from 2016 to 2021, region from 2016 to 2021, and global price from 2016 to 2027.
A thorough evaluation of the restrains included in the report portrays the contrast to drivers and gives room for strategic planning. Factors that overshadow the market growth are pivotal as they can be understood to devise different bends for getting hold of the lucrative opportunities that are present in the ever-growing market. Additionally, insights into market expert’s opinions have been taken to understand the market better.

Global Photoresist and Photoresist Ancillary Market: Segment Analysis
The research report includes specific segments by region (country), by manufacturers, by Type and by Application. Each type provides information about the production during the forecast period of 2016 to 2027. by Application segment also provides consumption during the forecast period of 2016 to 2027. Understanding the segments helps in identifying the importance of different factors that aid the market growth.

Segment by Type
G-Line And I-Line
KrF
ArF Dry
ArF Immersion
Antireflective Coatings
Photoresist Developers
Edge Bead Removers
Other

Segment by Application
Semiconductors And Integrated Circuits (Ics)
Printed Circuit Boards (PCB)
Others (Including MEMS, NEMS, Sensors Etc.)

By Company
JSR Corporation
The Dow Chemical Company
Tokyo Ohka Kogyo
Avantor Performance Materials
Merck KGaA
FUJIFILM Electronic Materials
DuPont
Shin-Etsu Chemical
Sumitomo Chemical
LG Chem

Production by Region
North America
Europe
China
Japan

Consumption by Region
North America
U.S.
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
India
Australia
Taiwan
Indonesia
Thailand
Malaysia
Philippines
Vietnam
Latin America
Mexico
Brazil
Argentina
Middle East & Africa
Turkey
Saudi Arabia
UAE

Frequently Asked Questions