Global Hard Chemical-Mechanical Polishing (CMP) Pad Market Research Report 2021

CMP Pad (Chemical Mechanical Polishing Pad) is a product which increases semiconductor integration by smoothening the semiconductor wafer surface through physical and chemical polishing processes. CMP Pad can be divided Hard CMP Pad and Soft CMP Pad. As for Hard CMP Pad, its base material is polyurethane.
Hard Chemical-Mechanical Polishing (CMP) Pad market has several key players, like DuPont, Cabot, FUJIBO, and JSR Corporation, with market share 95.01% in value. Global giant manufactures mainly distributed in USA, Japan and Taiwan. It has unshakable status in this field.
China Taiwan is the largest consumption region of hard CMP Pads, with a consumption market share nearly 22.00% in 2019. The second place is South Korea; following China Taiwan with the consumption market share over 21.38% in 2019.

Market Analysis and Insights: Global Hard Chemical-Mechanical Polishing (CMP) Pad Market
The global Hard Chemical-Mechanical Polishing (CMP) Pad market was valued at US$ 638.8 million in 2019 and it is expected to reach US$ 809.5 million by the end of 2026, growing at a CAGR of 3.7% during 2021-2026.

Global Hard Chemical-Mechanical Polishing (CMP) Pad Market: Drivers and Restrains
The research report has incorporated the analysis of different factors that augment the market’s growth. It constitutes trends, restraints, and drivers that transform the market in either a positive or negative manner. This section also provides the scope of different segments and applications that can potentially influence the market in the future. The detailed information is based on current trends and historic milestones. This section also provides an analysis of the volume of production about the global market and about each type from 2016 to 2027. This section mentions the volume of production by region from 2016 to 2027. Pricing analysis is included in the report according to each type from the year 2016 to 2027, manufacturer from 2016 to 2021, region from 2016 to 2021, and global price from 2016 to 2027.
A thorough evaluation of the restrains included in the report portrays the contrast to drivers and gives room for strategic planning. Factors that overshadow the market growth are pivotal as they can be understood to devise different bends for getting hold of the lucrative opportunities that are present in the ever-growing market. Additionally, insights into market expert’s opinions have been taken to understand the market better.

Global Hard Chemical-Mechanical Polishing (CMP) Pad Market: Segment Analysis
The research report includes specific segments by region (country), by manufacturers, by Type and by Application. Each type provides information about the production during the forecast period of 2016 to 2027. by Application segment also provides consumption during the forecast period of 2016 to 2027. Understanding the segments helps in identifying the importance of different factors that aid the market growth.

Segment by Type
Polyurethane CMP Pads
Other Materials

Segment by Application
300mm Wafer
200mm Wafer
Others

By Company
DuPont
Cabot
FOJIBO
JSR Corporation
TWI Incorporated
Hubei Dinglong Co.,Ltd
FNS TECH Co., LTD
3M
SKC
IV Technologies Co., Ltd.

Production by Region
North America
South Korea
Japan
China Taiwan
China

Consumption by Region
North America
U.S.
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
India
Australia
Taiwan
Indonesia
Thailand
Malaysia
Philippines
Vietnam
Latin America
Mexico
Brazil
Argentina
Middle East & Africa
Turkey
Saudi Arabia
UAE

Frequently Asked Questions