The positive photoresist resin is a kind of phenolic formaldehyde called a novolac resin, which provides the adhesion and chemical corrosion resistance of the photoresist. When no dissolution inhibitor is present, the novolac resin dissolves in the developer and is photosensitive. The agent is a photoactive compound, the most common being diazonaphthoquinone (DNQ).
Negative resist refers to a short chain molecule of a polymer that crosslinks a long chain molecule due to illumination. The short-chain molecular polymer can be dissolved by the developer, so that the exposed portion of the positive gel is removed, and the exposed portion of the negative gel is retained.

The global Negative Photoresist market was valued at 2350 million US$ in 2018 and will reach 3830 million US$ by the end of 2025, growing at a CAGR of 6.3% during 2019-2025.
This report focuses on Negative Photoresist volume and value at global level, regional level and company level. From a global perspective, this report represents overall Negative Photoresist market size by analyzing historical data and future prospect.
Regionally, this report categorizes the production, apparent consumption, export and import of Negative Photoresist in North America, Europe, China, Japan, Southeast Asia and India.
For each manufacturer covered, this report analyzes their Negative Photoresist manufacturing sites, capacity, production, ex-factory price, revenue and market share in global market.

The following manufacturers are covered:
JSR
Dowdupont
Shin-Etsu Chemical
Fujifilm Electronics
Sumitomo Chemical
Merck
Allresist
Avantor Performance Materials
Microchemicals
Toyo Ink
Chimei
MCC
NSCC
LG Chemical
DNP
Daxin

Segment by Regions
North America
Europe
China
Japan
Southeast Asia
India

Segment by Type
Negative Etch Resists
Thick Negative Resists
Negative Lift-Off Resists

Segment by Application
LCDs
Printed Circuit Boards
Others